"VELDHOVEN, The Netherlands, April 22, 2002 - ASML today announced that the company has received the industry's first order for an extreme ultraviolet (EUV) lithography beta tool from Intel Corp., the world's largest semiconductor manufacturer. The EUV beta tool will use 300 mm wafers and is initially targeted for 45 nm resolution capability. Delivery is slated for the second half of 2005.
EUV lithography is an extension of optical lithography techniques into Extreme Ultra Violet wavelengths. EUV uses light with a wavelength of 13.5 nm (more than 10 times shorter than current lithography technology) to image critical layers with feature sizes below 45 nm. The new technology also differs from existing optical lithography in that it uses reflective optics and reflective reticles (photomasks)."
Wat gaan ze hier mee maken?
EUV lithography is an extension of optical lithography techniques into Extreme Ultra Violet wavelengths. EUV uses light with a wavelength of 13.5 nm (more than 10 times shorter than current lithography technology) to image critical layers with feature sizes below 45 nm. The new technology also differs from existing optical lithography in that it uses reflective optics and reflective reticles (photomasks)."
Wat gaan ze hier mee maken?